2000 ICP Metal 150
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2000 ICP Metal 150 |
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Model |
2000 ICP Metal 150 |
Rating |
3P5W, 208V, 50HZ |
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Weight(KG) |
1520 |
L*W*H(mm) |
2670*1470*1770 |
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Service Life(Years) |
>20 |
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Purpose |
The SINO PLASMA 2000 ICP Metal 150 plasma chemical etching unit is designed for plasma chemical etching of aluminum films. |
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Main Characteristic |
Four side platform, have one VCE Cassette Station,one Chamber process for Al&one Chamber process for PR Remove,Metal Chamber Use 10 GAS line,Main Chamber Chuck use Esc, use High speed Vacuum Turbo Pump,use two dry pump for Main Chamber,and one Chiller for each Chamber,use 13.56Mhz RF Generator,process 6inch Wafer |
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