Zipper closure
1/5 zip athletic pullovers for men. Stretchy, lightweight, fast-drying
fabric for superior performance.
REGULAR FIT - US standard sizes. An athletic fit that sits close to the
body
for a wide range of motion, designed for optimal performance and all day
comfort.
FEATURES - Quarter zip closure;Thumbholes on long sleeves to keep them
in
place during workout
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Model
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Vertical 1150℃ Thermodiffusion Furnace
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Rating
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Φ3 AC 400V 50KVA
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Weight(KG)
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2000KG
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L*W*H(mm)
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3870x1000x3200 mm
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Service Life(Years)
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20 Years
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Purpose
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The machine is designed for high-temperature thermal treatment
of silicon wafers with a diameter of 200 mm in order to obtain profiles of
alloying impurities and oxidation of the silicon surface.
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Main Characteristic
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1.High-temperature operation: Diffusion furnaces typically operate at high temperatures to facilitate
the diffusion of impurities in semiconductor materials. For example, their operating temperature range is usually between 600-1200℃.
2.Precise temperature control: To ensure the accuracy and consistency of the process, diffusion furnaces require precise temperature control.
The precision of the constant temperature zone can reach ±0.5℃,
and they have functions for automatic ramp-up and ramp-down as well as constant temperature.
3.Atmosphere control: The atmosphere control inside the diffusion furnace is crucial to ensure the effectiveness
of impurity doping and crystal quality.
Operations are typically conducted in a vacuum or inert gas environment to prevent
contamination from impurities.
4.Batch processing capability: Diffusion furnaces are designed to process a large
number of substrates, making them suitable for mass production. For example,
horizontal diffusion furnaces can accommodate multiple process tubes,
thereby achieving efficient batch processing.
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