6000 ICP Metal for 200
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6000 ICP Metal for 200 |
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Model |
6000 ICP Metal for 200 |
Rating |
3P5W, 208V, 50HZ |
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Weight(KG) |
1800 |
L*W*H(mm) |
2760*2810*2140 |
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Service Life(Years) |
>20 |
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Purpose |
The SINO PLASMA 6000 ICP plasma chemical etching unit is designed for plasma chemical etching of aluminum films. |
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Main Characteristic |
Six side platform, have Two VCE Cassette Station,one Chamber process for Al&one Chamber Process for PR Remove,Metal Chamber Use 10 GAS line,Main Chamber Chuck use Esc, use High speed Vacuum Turbo Pump,use two dry pump for Main Chamber,and one Chiller for each Chamber,use 13.56Mhz RF Generator,process 8inch Wafer. |
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